ELE 464 Microelectronic Fabrication
Principles of processes used in the fabrication of bipolar and MOS integrated circuits and components. Photolithography, crystal and epitaxial growth, oxidation, diffusion and ion implantation, chemical and physical film deposition and etching. Passive and active component and process design. Occasional laboratory periods may be substituted for equivalent class time. Lecture 3 hours. One design credit. Prerequisite: ELE 262.
Credits: 3
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